Peak Nano is expanding production of its NanoPlex™ High Dielectric Constant (HDC) capacitor film by 20 times at its facility in Macedonia, Ohio, USA, with a $20 million investment in equipment, facilities and staffing.
The expansion aims to meet the growing demand for advanced capacitor films used in power grids, AI data centres, fusion energy and defence systems. NanoPlex technology uses multiple layers of polymers arranged at the nanoscale to enhance energy storage performance, improve thermal efficiency and extend product lifespan compared with conventional single-polymer films. The advanced film is designed as a drop-in solution for existing cqapacitor applications.
As part of the expansion, Peak Nano is installing a new cast film production line supplied by Davis-Standard, marking the first full-scale production line specifically designed for nanolayered film. Once fully operational, the facility is expected to achieve an annual production capacity of up to 3 million pounds (approximately 1,361 tonnes) by the first quarter of 2028.
The investment will also support workforce expansion, with more than 15 technician positions currently available and further growth planned for 2027. NanoPlex technology originated from research conducted at Case Western Reserve University, DARPA and the U.S. Naval Research Laboratory. Peak Nano stated that the technology is engineered and manufactured entirely in the United States.